16.35 Redo Exercise 16.5 using the following parameters from a 28-nm CMOS technology: VDD = 0.9 V, Vtn = −Vtp = 0.3 V, μn/μp = 1.5, and μnCox = 750 µA/V2. QN and QP have L = 28 nm and ...
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16.34 Repeat Example 16.3 for a CMOS inverter fabricated in a 0.13-µm process for which VDD = 1.3 V, Vtn = | Vtp | = 0.4 V, μn = 4μp, and μnCox = 500 µA/V2. In addition, QN and QP ...
16.33 Consider the CMOS inverter of Fig. 16.22 with QN and QP matched and with the input vI rising slowly from 0 to VDD. At what value of vI does the current flowing through QN and QP reach its peak? ...
D 16.32 There are situations in which QN and QP of the CMOS inverter are deliberately mismatched to realize a certain desired value for VM. Show that the value required of the parameter r of Eq. (16.40) is given by
16.31 A CMOS inverter for which kn = 5kp = 250 µA/V2 and Vt = 0.4 V is connected as shown in Fig. P16.31 to a sinusoidal signal source having a Thévenin equivalent voltage of 0.1-V peak amplitude and resistance ...
*16.30 For a technology in which Vtn = 0.3VDD, show that the maximum current that the inverter can sink while its low-output level does not exceed 0.1 VDD is 0.065 . For VDD = 1.2V, = 500 µA/V2, find (W/L)n ...
16.29 Consider a CMOS inverter fabricated in a 0.25-µm CMOS process for which VDD = 2.5 V, Vtn = −Vtp = 0.5 V, and μnCox = 3.5 μpCox = 115µA/V2. In addition, QN and QP have L = 0.25µm and ...
16.28 Consider a CMOS inverter fabricated in a 65-nm CMOS process for which VDD = 1 V, Vtn = −Vtp = 0.35 V, and μnCox = 5.4μpCox = 540 µA/V2. In addition, QN and QP have L = 65 nmand ...
**16.27 Derive an expression for VM of the pseudo-NMOS inverter shown in Fig. 16.21. You may assume that Vt = Vtn = |Vtp| and r ≡ kn/kp.
*16.26 Consider a pseudo-NMOS inverter as shown in Fig. 16.21 and fabricated in a 65-nm CMOS technology for which VDD = 1.0 V, |Vt| = 0.35 V, kn/kp = 5.4, and kn = 540 µA/V2. (a) Find VOH. (b) Derive ...